Thursday, January 18, 2018
Search
  
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
Intel Says That Patches for Spectre, Meltdown Affect Newer Chips
Redbox Says Disney's Lawsuit is an Anti-competitive Behavior
Nintendo Releases Cardboard Accessories for Switch
IC Knowledge Outlines EUV, 7nm and 5nm Progress
Samsung Starts Producing First 16-Gigabit GDDR6
Apple Accelerates US investment, Plans to Pay $38 billion in Foreign Cash Taxes
Everspin Begins Volume Production of 40nm STT-MRAM
Broadcom is Under Antitrust Investigation by FTC
Active Discussions
Which of these DVD media are the best, most durable?
How to back up a PS2 DL game
Copy a protected DVD?
roxio issues with xp pro
Help make DVDInfoPro better with dvdinfomantis!!!
menu making
Optiarc AD-7260S review
cdrw trouble
 Home > News > General Computing > GLOBALF...
Last 7 Days News : SU MO TU WE TH FR SA All News

Tuesday, March 19, 2013
GLOBALFOUNDRIES Partners with ASML for 28nm and 20nm Chip Tapeouts


Brion Technologies, a division of ASML, on Monday announced a partnership with GLOBALFOUNDRIES to deliver high volume computational lithography capabilities for 28 nm and 20 nm tapeouts, while also accelerating the development of future nodes, including extreme ultraviolet (EUV) lithography.

The process window is very challenging for leading edge technologies and substantially impacts yield, time to market and ultimately profitability. ASML claims that its holistic lithography approach enables both process window enhancement and process window control from design to mask tapeout to chip manufacturing by leveraging the computational model accuracy that comes from tight integration with the ASML scanners including FlexRay & FlexWave.

GLOBALFOUNDRIES is working with Brion to ensure that their foundry customers have a cost effective semiconductor manufacturing capability available. Critical to achieving this is the use of Tachyon Flex, which is the platform architecture that allows the Tachyon applications to run on a customer's existing compute cluster, distributed across many thousands of CPU cores.

"At 28nm and below it is necessary to explore and realize every possible process window improvement to achieve a manufacturable patterning solution," said Chris Spence, Senior Fellow of GLOBALFOUNDRIES. "We have found that Brion's OPC and Computational Lithography solutions enable us to achieve this goal and ensure the best possible yield for GLOBALFOUNDRIES' customers."

In integrated circuits design, tape-out or tapeout is the final part of the design cycle before a photomask is manufactured. In its current practice (also known as 'mask data preparation' or MDP) chip makers perform checks and make modifications to the mask design specific to the manufacturing process. Optical proximity correction (OPC) is the most common example, which corrects for the diffraction and interference behavior of light when printing the sub-micron scale features of modern integrated circuit designs.


Previous
Next
Eye-tracking Technologies Seen As The Next Legal Battle Field For Samsung, LG        All News        Protect Your USB Pen Drive with NTI Pocket Ninja
Panasonic Releases New SD UHS-II - PCI-Express Bridge LSIs     General Computing News      ARM Chief Retires

Get RSS feed Easy Print E-Mail this Message

Related News
Intel Uses Cobalt Interconnect for 10nm, Global Foundries Detail EUV Lithography for 7nm
Samsung Said to Have Placed Huge EUV Equipment Order From ASML
Globalfoundries and Intel to Talk About 10, 7nm at IEDM
GLOBALFOUNDRIES Introduces AutoPro Automotive Platform for Connected Cars
Globalfoundries Asks EU to Probe TSMC
GLOBALFOUNDRIES Introduces New 12nm FinFET Technology
GLOBALFOUNDRIES and IBM Develop Custom 14nm FinFET Technology That Leverages both FinFET and SOI
ASML Demonstrates a 250-watt EUV Source
ASML Announces Holistic Lithography Product Suite for The 7/5 Nanometer Node
GLOBALFOUNDRIES Says New 7LP Technology Offers 40 Percent Performance Boost Over 14nm FinFET
GLOBALFOUNDRIES and Chengdu Invest in China-based FDX FD-SOI Design Centers
ASML Countersues Nikon Over Alleged Patent Infringement

Most Popular News
 
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2018 - All rights reserved -
Privacy policy - Contact Us .