EBR
Electron Beam Recorder
The Electron Beam Recorder (EBR) is an optical disc master recorder using e-beam exposure to achieve the very small feature sizes that will be needed for the next several generations of pre-recorded and erasable optical, MO and PC discs. It uses an extra high precision version system to achieve new levels of performance in terms of track pitch accuracy and uniformity. To this are added high precision absolute radial position measuring systems.
The processes used are compatible with current photo resist coating and developing. The only change is in the resists and developers used. While some existing coaters may not be able to achieve the resist coating thickness or uniformity required, NTE's proven resist coating technology has the reserve of performance necessary to precisely control the depth of the features.
Where needed, steep sided features can be produced without requiring additional process steps such as Reactive Ion Etching (RIE). This is particularly useful for low noise land/groove mastering.
The EBR has been designed from the outset to have sufficient mechanical performance to be upgradeable to meet the needs of several generations of new formats. Its fundamental performance exceeds the ability of currently proposed playback systems including SIL, MAMMOS and Near Field Recording.
NTE has planned a clear upgrade path for the EBR. The first version is intended for very high density "single beam" structures. A range of e-beam columns will be made to extend this to include "dual beam" structures. The mechanical and control systems will remain the same. The only changes will be to the e-beam column and its control electronics. Very fast modulation speeds will be available for high density pre-recorded and erasable formats. Rise times down to 1nsec will be available (10% to 90%).
Features Summary
- Translation System
Translation inside to outside and outside to inside
Recording Area 0 to 75 mm radius
Track Pitch Range 0 nm to 2,000 nm
Setting Steps 0.04 nm
Average Track Pitch Stability +/- 5 nm
Local Track Pitch Stability +/- 5 nm
Radial Position Repeatability 5 µm at any radius
Absolute Radial Position Measurement +/- 0.056 µm at any radius
- Rotation System
Rotation CW and CCW
Rotation Modes CLV and CAV
Rotation Speed 2 to 60 Hz
Setting Steps 0.001 Hz or phase locked to external clock
Servo Modes TT servo can act as "slave" or "master" for external formatters
- E-Beam Column
Recording Spot Diameter 80 to 400 nm
Beam Current 300 nA at 200 nm spot diameter
Current Stability +/- 1% over one master
Calibration Focus, beam current and spot quality all automatically verified before each
master
- Blanking / Beam Modulation
Blanking Rise Time 1 nsec for 10% to 90%
- Deflection
Deflection Range up to +/- 400 nm
Deflection Speed - Wobble up to 50 MHz
Deflection Speed - Step 1 nsec 0 nm to +/- 400 nm
Master Substrates
Standard 8 inch Si wafer
Special Other sizes smaller than the standard can be accommodated to order
Vacuum System
Pumps Industry standard Ion, Turbo Molecular and Mechanical pumps
Valves and Gauges Industry standard units
Control Fully automatic, start-up and operation with fail safe protection
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