Saturday, April 21, 2018
Submit your own News for
inclusion in our Site.
Click here...
Breaking News
GSMA Delays eSIM Technology as U.S. DoJ of U.S. Probes Coordination With AT&T and Verizon
Apple to Replace Some MacBook Pro Laptop Batteries
ZTE's Nubia Red Gaming Phone Released
LG Display's OLED Smartphone Screens Still Not Ready For Apple
Nintendo Labo Kits Now Available
June's VLSI Symposium Focuses on Next Generation Transistor Technology and MRAM
Samsung Not Interested in Nokia's Health Unit
ZTE Says Company's Survival at Risk
Active Discussions
Which of these DVD media are the best, most durable?
How to back up a PS2 DL game
Copy a protected DVD?
roxio issues with xp pro
Help make DVDInfoPro better with dvdinfomantis!!!
menu making
Optiarc AD-7260S review
cdrw trouble
 Home > News > General Computing > ASML 34...
Last 7 Days News : SU MO TU WE TH FR SA All News

Wednesday, March 01, 2017
ASML 3400B Production Platform For EUVL Ready For Shipping

At the SPIE Advanced Lithography conference, ASML announced the NXE:3400B, the extreme ultraviolet lithography scanner that it hopes makes it into volume-production fabs.

Shipping this week, the first 3400B is the company's first rated to produce 125 wafers/hour, the throughput target for use in production fabs. This target was not achieved by increasing the light source up to the target level of 250 W. ASML says the system should eventually be able to hit 210W. However, the system's high throughput was achieved by speeding up wafer handling inside the machine. Initially, the 3400B is expected to run at 148 W to produce 104 wafers/h.

For those not familiar with Extreme ultraviolet lithography (also known as EUV or EUVL), it is the a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for high volume use by 2020.

Immersion lithography is still at least three times faster than EUV, due to EUV source power limitations. Current throughput at customer site is 1,200 wafers per day with 80% availability, while conventional tools produce 5,000 wafers per day with 95% availability.

Currently, 14 EUV systems have been installed in various plants worldwide. Most of them are expected to be upgraded, a process that could take two years.

ASML plans to upgrade the systen's light-source, in part because it knows that users need headroom to make up for underperforming resist chemicals and optics that will degrade over time. But the company is cannot disclose when those upgrades will arrive.

Still, real hurdles ahead remain towards using EUVL equipment for the future generation chips. For instance, it is not clear whether photo-resist materials will be effective at light exposures of 20 mJ/cm2. The fact is that current resists need 30 mJ/cm2. What's more, the road map still depends on a variety of other ASML and third-party tools arriving in synch, including pellicles to keep contaminating particles off of EUV wafers.

Microsoft Unveils First Windows Mixed Reality Dev Kit        All News        GDC 2017: Valve Demos SMI Eye Tracking on its VR Platform
Microsoft Unveils First Windows Mixed Reality Dev Kit     General Computing News      GDC 2017: Valve Demos SMI Eye Tracking on its VR Platform

Get RSS feed Easy Print E-Mail this Message

Related News
ASML's Solid Q1 Results Demonstrate Further Adoption of EUV Technology
Imec and Cadence Tape Out First 3nm Chip
SPIE: ASML Demos NXE 3400B Production of 140 Wafers per Hour
IMEC Researchers Optimistic About Dealing With EUV Defects in 5nm Node
IBM Researchers Talk About the Future of EUV at SPIE
Samsung Breaks Ground on New EUV Line in Hwaseong
Samsung and Qualcomm Expand Foundry Cooperation on EUV Process Technology
ISSCC: Samsung Working on 7-nm EUV SRAM, Intel Details 10-nm SRAM
IC Knowledge Outlines EUV, 7nm and 5nm Progress
Intel Uses Cobalt Interconnect for 10nm, Global Foundries Detail EUV Lithography for 7nm
Samsung Foundry in Advanced Discussions With New Customers for 7nm Chips
Samsung to Talk About 7nm SRAM EUV Design at ISSCC

Most Popular News
Home | News | All News | Reviews | Articles | Guides | Download | Expert Area | Forum | Site Info
Site best viewed at 1024x768+ - CDRINFO.COM 1998-2018 - All rights reserved -
Privacy policy - Contact Us .