To take high-quality photographs, CMOS image sensors need to hold as much light, or photons, as possible and transmit the right color information to the photodiode. ISOCELL forms a physical barrier between the neighboring pixels, reducing color crosstalk and expanding the full-well capacity. This enables each pixel to absorb and hold more light than the conventional backside-illuminated (BSI) image sensor design for superior image quality.
With the introduction of ISOCELL Plus, Samsung pushes pixel isolation technology to a new level through an optimized pixel architecture. In the existing pixel structure, metal grids are formed over the photodiodes to reduce interference between the pixels, which can also lead to some optical loss as metals tend to reflect and/or absorb the incoming light. For ISOCELL Plus, Samsung replaced the metal barrier with an innovative new material developed by Fujifilm, minimizing optical loss and light reflection.
Samsung says that the new ISOCELL Plus delivers higher color fidelity along with up to a 15-percent enhancement in light sensitivity. The technology also enables image sensors to equip 0.8-micrometer (µm) and smaller-sized pixels without any loss in performance, making it an optimal solution for developing super-resolution cameras with over 20 megapixels.
The ISOCELL Plus is showcased at the Mobile World Congress Shanghai, held from June 27 to 29.